'ParticlePLUS' is a simulation software which solves the behavior of plasma and neutral gas in the plasma process reactor.
It consists of the following 3 modules ;
 plasma solver
 neutral solver
 sputtered neutral solver
Plasma solver solves electron and ion motion using Particle in cell ( PIC ) method. Plasma solver employs 'implicit time scheme' to relax the limitation of dt arising from 'electron plasma oscillation' ω • dt < 2.
MonteCarlo scattering model with null collision method is used for the reactions between working gas and electron/ion. With this model, precise atomicmolecular processes can be calculated quickly.
Another topic is the 'external circuit model with Matching Box'. Using this model, we can correctly estimate the applied voltage on the RF electrode and therefore, can obtain selfconsistent results.
Parallel computation is possible in Plasma solver using 'particle division method'.
Neutral solver gives the initial profile of the working gas which will be used in Plasma solver. DSMC MonteCarlo method is employed on the same mesh used in Plasma solver.
In the simulation of Magnetron sputtering device, it is required to estimate the behaviors of the sputtered neutral particle from the target. Sputtered neutral solver calculates the behaviors of the sputtered neutral on the same mesh employed in Plasma solver. Using Test particle model, it is able to calculate the sputtered neutral flux profile on the substrate quickly.
Table 1 ParticlePLUS Overview
Code Name  Modules  Major Characteristics 

ParticlePLUS  plasma solver 

plasma solver (parallel ver.) 


neutral solver ( for initial distribution ) 


sputtered neutral solver 

Download
 ParticlePLUS Brochure
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